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*AHRC International Placement Scheme

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*AHRC International Placement Scheme

January 15, 2015

*To be updated with official 2015 date. Currently using an approximate closing date based on 2014 deadline.

AHRC International Placement Scheme

The annual International Placement Scheme (IPS) provides funded research fellowships at world-leading international research institutions for early career researchers, doctoral-level research assistants and AHRC/ESRC*-funded doctoral students. From 2014, IPS fellowships are available at:

*ESRC candidates are eligible to apply to Library of Congress, but not the other IPS institutions.

Aims of the International Placement Scheme

  • to provide early career researchers, doctoral-level research assistants and AHRC/ESRC-funded doctoral students with dedicated access to the internationally renowned research collections/ programmes/ expertise held at the host IPS institutions;
  • through such access, to enhance the depth, range and quality of research activities conducted by scholars;
  • to create opportunities for networking with other international scholars at those institutions.

IPS Privileges

Privileges vary across hosts, but broadly IPS fellows will enjoy:

  • A fellowship of two to six months.
  • A travel stipend of £600 – £800, visa costs paid, plus a £1200 monthly stipend (in addition to the normal stipend paid as part of any existing AHRC/ESRC award).
  • Some IPS hosts can help fellows find accommodation.
  • IPS fellows will have a working or office space, and enjoy access to their host’s collections, resources, facilities, curators and other scholars.
  • IPS fellows will be part of a cohort of international fellows, and receive support from hosts with a history of accommodating international fellows.
  • Opportunities to take part in workshops, conferences, symposia, special lectures, as well as present work to peers and mentors, and network and forge international contacts and collaboration.
  • Value added to current and future research and an enhancement to their CV.